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Ultrafast 3D nanofabrication via digital holography

Engineering and Technology

Ultrafast 3D nanofabrication via digital holography

W. Ouyang, X. Xu, et al.

Discover a groundbreaking digital holography-based two-photon lithography platform that revolutionizes the parallel printing of complex 3D nanostructures with remarkable speed and precision. This innovative system achieves a staggering fabrication rate of 2,000,000 voxels/sec and promises to take TPL technology to new heights, validated by large-scale metastructures and optical devices. This cutting-edge research was conducted by Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, and Shih-Chi Chen.

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Abstract
There has been a compelling demand of fabricating high-resolution complex three-dimensional (3D) structures in nanotechnology. While two-photon lithography (TPL) largely satisfies the need since its introduction, its low writing speed and high cost make it impractical for many large-scale applications. We report a digital holography-based TPL platform that realizes parallel printing with up to 2000 individually programmable laser foci to fabricate complex 3D structures with 90 nm resolution. This effectively improves the fabrication rate to 2,000,000 voxels/sec. The promising result is enabled by the polymerization kinetics under a low-repetition-rate regenerative laser amplifier, where the smallest features are defined via a single laser pulse at 1 kHz. We have fabricated large-scale metastructures and optical devices of up to centimeter-scale to validate the predicted writing speed, resolution, and cost. The results confirm our method provides an effective solution for scaling up TPL for applications beyond laboratory prototyping.
Publisher
Nature Communications
Published On
Mar 27, 2023
Authors
Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, Shih-Chi Chen
Tags
digital holography
two-photon lithography
3D nanostructures
fabrication rate
resolution
photoresist
metastructures
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