Engineering and Technology

Ultrafast 3D nanofabrication via digital holography

W. Ouyang, X. Xu, et al.

Experience the cutting edge of 3D nanoprinting with our novel digital holography-based two-photon lithography platform! Developed by Wenqi Ouyang and colleagues, this system achieves a staggering 2,000,000 voxels per second while maintaining an impressive resolution of 90 nm. Discover how we’re pushing the limits of fabrication technology beyond conventional laboratory prototyping.

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Abstract

This paper presents a digital holography-based two-photon lithography (TPL) platform for ultrafast 3D nanoprinting. The system uses a 1 kHz fs regenerative laser amplifier to enable parallel printing with up to 2000 individually controllable laser foci, achieving a fabrication rate of 2,000,000 voxels/sec and 90 nm resolution. A custom-developed photoresist optimizes polymerization kinetics for this high-peak-power laser source. Large-scale metastructures and optical devices were fabricated to validate the system's performance, demonstrating its potential for scaling up TPL beyond laboratory prototyping.

Publisher

Nature Communications

Published On

Mar 01, 2023

Authors

Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, Shih-Chi Chen

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