This paper presents a digital holography-based two-photon lithography (TPL) platform for ultrafast 3D nanoprinting. The system uses a 1 kHz fs regenerative laser amplifier to enable parallel printing with up to 2000 individually controllable laser foci, achieving a fabrication rate of 2,000,000 voxels/sec and 90 nm resolution. A custom-developed photoresist optimizes polymerization kinetics for this high-peak-power laser source. Large-scale metastructures and optical devices were fabricated to validate the system's performance, demonstrating its potential for scaling up TPL beyond laboratory prototyping.
