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Abstract
This paper presents a digital holography-based two-photon lithography (TPL) platform for ultrafast 3D nanoprinting. The system uses a 1 kHz fs regenerative laser amplifier to enable parallel printing with up to 2000 individually controllable laser foci, achieving a fabrication rate of 2,000,000 voxels/sec and 90 nm resolution. A custom-developed photoresist optimizes polymerization kinetics for this high-peak-power laser source. Large-scale metastructures and optical devices were fabricated to validate the system's performance, demonstrating its potential for scaling up TPL beyond laboratory prototyping.
Publisher
Nature Communications
Published On
Mar 01, 2023
Authors
Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, Shih-Chi Chen
Tags
digital holography
two-photon lithography
3D nanoprinting
laser amplifier
photoresist
metastructures
optical devices
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