Engineering and Technology

Ultrafast 3D nanofabrication via digital holography

W. Ouyang, X. Xu, et al.

Discover a groundbreaking digital holography-based two-photon lithography platform that revolutionizes the parallel printing of complex 3D nanostructures with remarkable speed and precision. This innovative system achieves a staggering fabrication rate of 2,000,000 voxels/sec and promises to take TPL technology to new heights, validated by large-scale metastructures and optical devices. This cutting-edge research was conducted by Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, and Shih-Chi Chen.

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Abstract

This paper presents a digital holography-based two-photon lithography (TPL) platform that enables parallel printing of complex 3D nanostructures with significantly improved speed and resolution. Using a 1 kHz fs regenerative laser amplifier, the system achieves a fabrication rate of 2,000,000 voxels/sec with 90 nm lateral and 141 nm axial resolution. A custom-designed photoresist optimizes polymerization kinetics for the high-peak-power laser source. Large-scale metastructures and optical devices validate the system's performance, demonstrating its potential for scaling up TPL beyond laboratory prototyping.

Publisher

Nature Communications

Published On

Mar 27, 2023

Authors

Wenqi Ouyang, Xiayi Xu, Wanping Lu, Ni Zhao, Fei Han, Shih-Chi Chen