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Abstract
This paper introduces a non-contact metrology technique using scanning NV magnetometry (SNVM) to investigate Magnetic Random Access Memory (MRAM) performance at the individual bit level. The researchers demonstrate magnetic reversal characterization in individual bits to extract key magnetic properties, thermal stability, and switching statistics, highlighting the ability to identify out-of-distribution bits and enabling failure analysis. The study benchmarks two distinct bit etching processes, showing SNVM's potential for early-stage screening in MRAM production lines.
Publisher
npj Spintronics
Published On
Jun 03, 2024
Authors
Vicent J. Borràs, Robert Carpenter, Liza Žaper, Siddharth Rao, Sebastien Couet, Mathieu Munsch, Patrick Maletinsky, Peter Rickhaus
Tags
scanning NV magnetometry
MRAM
magnetic reversal characterization
thermal stability
failure analysis
etching processes
metrology technique
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