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A quantum sensing metrology for magnetic memories

Engineering and Technology

A quantum sensing metrology for magnetic memories

V. J. Borràs, R. Carpenter, et al.

This groundbreaking research, conducted by Vicent J. Borràs, Robert Carpenter, Liza Žaper, Siddharth Rao, Sebastien Couet, Mathieu Munsch, Patrick Maletinsky, and Peter Rickhaus, unveils a non-contact metrology technique leveraging scanning NV magnetometry for detailed analysis of Magnetic Random Access Memory at the bit level. The findings not only reveal critical magnetic properties but also pave the way for enhanced failure analysis in MRAM production.

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~3 min • Beginner • English
Abstract
Magnetic random access memory (MRAM) is a leading emergent memory technology that is poised to replace current non-volatile memory technologies such as eFlash. However, controlling and improving distributions of device properties becomes a key enabler of new applications at this stage of technology development. Here, we introduce a non-contact metrology technique deploying scanning NV magnetometry (SNVM) to investigate MRAM performance at the individual bit level. We demonstrate magnetic reversal characterization in individual, <60 nm-sized bits, to extract key magnetic properties, thermal stability, and switching statistics, and thereby gauge bit-to-bit uniformity. We showcase the performance of our method by benchmarking two distinct bit etching processes immediately after pattern formation. In contrast to ensemble averaging methods such as perpendicular magneto-optical Kerr effect, we show that it is possible to identify out of distribution (tail-bits) bits that seem associated to the edges of the array, enabling failure analysis of tail bits. Our findings highlight the potential of nanoscale quantum sensing of MRAM devices for early-stage screening in the processing line, paving the way for future incorporation of this nanoscale characterization tool in the semiconductor industry.
Publisher
npj Spintronics
Published On
Jun 03, 2024
Authors
Vicent J. Borràs, Robert Carpenter, Liza Žaper, Siddharth Rao, Sebastien Couet, Mathieu Munsch, Patrick Maletinsky, Peter Rickhaus
Tags
scanning NV magnetometry
MRAM
magnetic reversal characterization
thermal stability
failure analysis
etching processes
metrology technique
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