Engineering and Technology
Magnetic memory driven by topological insulators
H. Wu, A. Chen, et al.
Explore the groundbreaking research by Hao Wu and colleagues that reveals a functional topological insulator-magnetic tunnel junction device with a remarkable tunneling magnetoresistance ratio of 102%. This innovative approach promises to reshape the landscape of magnetic memory technology by significantly reducing switching current densities at room temperature.
~3 min • Beginner • English
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