This work presents a novel passivation method to enhance the photochemical stability of quantum dots (QDs) using polymeric double shell structures from thiol-terminated poly(methyl methacrylate-b-glycidyl methacrylate) (P(MMA-b-GMA)-SH) block copolymer ligands. Cross-linking the GMA epoxides creates a densely cross-linked network, resulting in QDs encapsulated with a robust double layer. The resulting QDs show exceptional tolerance to heat and oxidants, making this approach promising for developing robust light-emitting or light-harvesting devices.
Publisher
NPG Asia Materials
Published On
Authors
Jaewan Ko, Byeong Guk Jeong, Jun Hyuk Chang, Joonyoung F. Joung, Suk-Young Yoon, Doh C. Lee, Sungnam Park, June Huh, Heesun Yang, Wan Ki Bae, Se Gyu Jang, Joona Bang
Tags
quantum dots
photochemical stability
passivation method
polymeric structures
cross-linking
light-emitting devices
light-harvesting
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