Engineering and Technology

Area-selective atomic layer deposition on 2D monolayer lateral superlattices

J. Park, S. J. Kwak, et al.

Discover groundbreaking advancements in selectivity with the superlattice-based area-selective atomic layer deposition (SAS-ALD) process, leveraging a 2D MoS2-MoSe2 lateral superlattice template. This pioneering work by Jeongwon Park and colleagues from various prestigious institutions offers unprecedented control over the deposition of materials at scales under 10 nm.... show more

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